发明名称 Metallization of ceramics through application of an adherent reducible layer
摘要 <p>The present invention provides improved techniques for metallizing ceramic substrates. The method comprises providing a ceramic substrate (20) and depositing a layer of reducible material (30) on the ceramic substrate. The layer of reducible material includes a reducible ceramic such as copper oxide. The ceramic substrate having the layer of reducible material disposed thereon is heated and the reducible material is contacted with a reducing agent to create a conductive region. The conductive region is either a metallized region formed by reduction, or it is a conductive ceramic formed through surface reduction. The present invention further provides a metallized ceramic substrate. The metallized layer comprises ceramic regions (40) having at least one constituent in common with the ceramic substrate. The ceramic substrate and the ceramic regions of the metallized layer are sintered to each other such that the metallized region (42) is interspersed between the sintered ceramic regions. In this fashion, the metal is firmly held to the ceramic substrate due to the presence of the bonded ceramic within the metallized layer.</p>
申请公布号 EP0698590(A2) 申请公布日期 1996.02.28
申请号 EP19950305684 申请日期 1995.08.15
申请人 AT&T CORP. 发明人 JIN, SUNGHO;LAW, HENRY HON;JOHNSON, DAVID WILFRED, JR.;THOMSON, JOHN, JR.;TIEFEL, THOMAS HENRY
分类号 H05K1/16;C04B41/45;C04B41/51;C04B41/52;C04B41/81;C04B41/85;C04B41/88;C04B41/89;H01L39/24;H01L41/22;H05K1/03;H05K3/10;H05K3/12;(IPC1-7):C04B41/88 主分类号 H05K1/16
代理机构 代理人
主权项
地址