PROCESSING APPARATUS, MEASURING APPARATUS, AND DEVICE MANUFACTURING METHOD

摘要

A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambience gas recirculating system which recirculates the ambience gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambience gas recirculated by the ambience. gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.