| 摘要 |
<p>In a heating device for warming and gasifying urea (12) (or its solution), incorporating a gas line (4) extending in a flow direction (S) and at least two gas-permeable heating surfaces (10a, 10b) separated from each other in the flow direction to define a heating chamber (11), an inlet opening feeding into the heating chamber is provided for supplying the urea (or its solution) into the heating chamber. Independent claims are included for: (1) a thermal reactor for use as above, comprising a heating device as above plus inflow and outflow openings (2, 3) connected by the gas line (4), which includes a gasification region; and (2) a corresponding process, in which urea (or its solution) is supplied into the gas line between the heating surfaces, to be heated, evaporated and removed with the effluent gas stream.</p> |
