Chemically amplified photosensitive resin composition and method for producing resist pattern using the same

摘要

A chemically amplified photosensitive resin composition including a compound represented by formula (1) and/or formula (4), a resin having an acid-dissociative dissolution-controlling group whose solubility in alkali increases under the action of an acid or an alkali-soluble resin, a photoacid generator, and an organic solvent, in which the solid concentration is 40% by mass to 65% by mass. R1, R2, and R3 independently represent a hydrogen atom or an alkyl group, R4 represents a group represented by formula (2) or (3), and R5 and R6 represent a monovalent hydrocarbon group which may have a substituent.;

主权项

1. A chemically amplified photosensitive resin composition, comprising:
a compound represented by the following formula (4):wherein, R5 and R6 represent a monovalent hydrocarbon group which may have a substituent;
a resin having an acid-dissociative dissolution-controlling group and whose solubility in alkali increases under the action of an acid; a photoacid generator; and an organic solvent, wherein a solid concentration is 40% by mass to 65% by mass.