| 发明名称 | Method of manufacturing a mask | ||
| 摘要 | A method of manufacturing a mask, the method including forming initial ribs such that forming the initial ribs includes forming at least two photoresist patterns such that the at least two photoresist patterns have different widths, are formed on at least one side of a mask substrate, and overlap each other, and performing an etching process at least two times; and forming final ribs such that the final ribs have curved sides having a different curvature radius than a curvature radius of initial curved sides of the initial ribs and have defined slit patterns, forming the final ribs including removing all but one of the at least two photoresist patterns, and performing an etching process. | ||
| 申请公布号 | US9372395(B2) | 申请公布日期 | 2016.06.21 |
| 申请号 | US201414260661 | 申请日期 | 2014.04.24 |
| 申请人 | SAMSUNG DISPLAY CO., LTD. | 发明人 | Prushinskiy Valeriy;Kim Minsoo |
| 分类号 | G03F1/80;G03F7/00 | 主分类号 | G03F1/80 |
| 代理机构 | Lee & Morse, P.C. | 代理人 | Lee & Morse, P.C. |
| 主权项 | 1. A method of manufacturing a mask, the method comprising: forming initial ribs such that forming the initial ribs includes: forming at least two photoresist patterns such that the at least two photoresist patterns have different widths, are formed on at least one side of a mask substrate, and overlap each other, andperforming an etching process at least two times; and forming final ribs such that the final ribs have curved sides having a different curvature radius than a curvature radius of initial curved sides of the initial ribs and have defined slit patterns, forming the final ribs including: removing all but one of the at least two photoresist patterns, andperforming an etching process. | ||
| 地址 | Yongin, Gyeonggi-do KR | ||