LASER EXPOSURE METHOD-BASED MICROPATTERN MANUFACTURING METHOD ENABLING FOCAL DEPTH ADJUSTMENT, FOCAL DEPTH ADJUSTMENT METHOD, AND DIFFRACTIVE ELEMENT MANUFACTURED BY THE MANUFACTURING METHOD

摘要

The present invention relates to a laser exposure method-based micropattern manufacturing method enabling focal depth adjustment, a focal depth adjustment method, and a diffractive element manufactured by the manufacturing method. More specifically, the present invention relates to a micropattern manufacturing method which comprises a focal depth adjustment unit, thereby interfering laser beams having different plane-direction widths from each other and injecting, in a photoresist, an interference laser beam having an interference pattern direction in the height direction, thereby enabling the improvement of height-direction line width, and further, a deformation mirror which is possible of curvature deformation is applied, thus enabling the adjustment of focal depth, thereby enabling the manufacturing of a triangular patterned diffractive element.