| 摘要 |
PROBLEM TO BE SOLVED: To provide a diffusion agent composition capable of excellently diffusing an impurity diffusion component in a semiconductor substrate even when a diffusion agent composition is coated on a semiconductor substrate with a nano-scale film thickness.SOLUTION: The diffusion agent composition includes: an impurity diffusion component (A); and a Si compound (B) capable of generating a silanol group by hydrolysis represented by Formula (1) below: RSi(NCO)...(1) (In Formula (1), R represents a hydrocarbon group and n is an integer of 3 or 4.). The moisture content of the diffusion agent composition is less than or equal to 0.05 mass%.SELECTED DRAWING: None |
