发明名称 Method for forming a substantially uniform array of sharp tips
摘要 A method for fabricating sharp asperities. A substrate is provided which has a mask layer disposed thereon, and a layer of micro-spheres is disposed superjacent the mask layer. The micro-spheres are for patterning the mask layer. Portions of the mask layer are selectively removed, thereby forming circular masks. The substrate is isotropically etched, thereby creating sharp asperities.
申请公布号 US5753130(A) 申请公布日期 1998.05.19
申请号 US19960665620 申请日期 1996.06.18
申请人 MICRON TECHNOLOGY, INC. 发明人 CATHEY, DAVID A.;TJADEN, KEVIN
分类号 H01J9/02;(IPC1-7):H01J9/00 主分类号 H01J9/02
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