发明名称 |
Method for forming a substantially uniform array of sharp tips |
摘要 |
A method for fabricating sharp asperities. A substrate is provided which has a mask layer disposed thereon, and a layer of micro-spheres is disposed superjacent the mask layer. The micro-spheres are for patterning the mask layer. Portions of the mask layer are selectively removed, thereby forming circular masks. The substrate is isotropically etched, thereby creating sharp asperities.
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申请公布号 |
US5753130(A) |
申请公布日期 |
1998.05.19 |
申请号 |
US19960665620 |
申请日期 |
1996.06.18 |
申请人 |
MICRON TECHNOLOGY, INC. |
发明人 |
CATHEY, DAVID A.;TJADEN, KEVIN |
分类号 |
H01J9/02;(IPC1-7):H01J9/00 |
主分类号 |
H01J9/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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