发明名称 |
Method for depinning the Fermi level of a semiconductor at an electrical junction and devices incorporating such junctions |
摘要 |
An electrical device in which an interface layer comprising arsenic is disposed between and in contact with a conductor and a semiconductor. In some cases, the interface layer may be a monolayer of arsenic. |
申请公布号 |
US9425277(B2) |
申请公布日期 |
2016.08.23 |
申请号 |
US201213552556 |
申请日期 |
2012.07.18 |
申请人 |
Acorn Technologies, Inc. |
发明人 |
Grupp Daniel E.;Connelly Daniel J. |
分类号 |
H01L29/78;H01L21/82;H01L29/45;H01L21/285;H01L29/08;H01L29/47;H01L29/66;H01L29/812;H01L29/16;H01L29/161 |
主分类号 |
H01L29/78 |
代理机构 |
Ascenda Law Group, PC |
代理人 |
Ascenda Law Group, PC |
主权项 |
1. An electrical junction, comprising an interface layer disposed between and in contact with a conductor and a semiconductor, the interface layer comprising arsenic and configured to reduce a height of a Schottky barrier between the conductor and the semiconductor from that which would exist at a junction between the conductor and the semiconductor without the interface layer disposed therebetween, and wherein the electrical junction has a specific contact resistance of less than or equal to approximately 100 Ω-μm2. |
地址 |
La Jolla CA US |