发明名称 Method for depinning the Fermi level of a semiconductor at an electrical junction and devices incorporating such junctions
摘要 An electrical device in which an interface layer comprising arsenic is disposed between and in contact with a conductor and a semiconductor. In some cases, the interface layer may be a monolayer of arsenic.
申请公布号 US9425277(B2) 申请公布日期 2016.08.23
申请号 US201213552556 申请日期 2012.07.18
申请人 Acorn Technologies, Inc. 发明人 Grupp Daniel E.;Connelly Daniel J.
分类号 H01L29/78;H01L21/82;H01L29/45;H01L21/285;H01L29/08;H01L29/47;H01L29/66;H01L29/812;H01L29/16;H01L29/161 主分类号 H01L29/78
代理机构 Ascenda Law Group, PC 代理人 Ascenda Law Group, PC
主权项 1. An electrical junction, comprising an interface layer disposed between and in contact with a conductor and a semiconductor, the interface layer comprising arsenic and configured to reduce a height of a Schottky barrier between the conductor and the semiconductor from that which would exist at a junction between the conductor and the semiconductor without the interface layer disposed therebetween, and wherein the electrical junction has a specific contact resistance of less than or equal to approximately 100 Ω-μm2.
地址 La Jolla CA US