| 摘要 |
In the present invention, a drawing pattern can be formed with little distortion caused by a head in the pattern drawing technique of forming a drawing pattern on a substrate by irradiating the substrate with light from the head. The pattern drawing device is provided with: a substrate support part; a head for emitting light; a head support part for supporting the head to face the substrate support part; a first control unit for forming a test pattern on a dummy substrate by emitting light from the head onto the dummy substrate supported by the substrate support part; a distortion information acquisition unit for acquiring pattern distortion information representing the distortion of the test pattern formed on the dummy substrate; a data correction unit for generating corrected drawing data by correcting the drawing data representing a drawing pattern on the basis of the pattern distortion information; and a second control unit for forming the drawing pattern on the substrate supported by the substrate support part by emitting light from the head on the basis of the corrected drawing data. |
