发明名称 Balanced source for plasma system
摘要 <p>A plasma system which is to be coupled to a power source, and plasma system (20) including a chamber (22,27) defining an internal cavity (25) in which a plasma is generated during operation; a coil (40) which during operation couples power from the power source (60) into the plasma within the chamber, the coil having first and second terminals (42,44); a first capacitor (C1) which is coupled between the first terminal and a reference potential; and a second capacitor (C2) connected to the second terminal and through which the power source is coupled to the second terminal. &lt;IMAGE&gt;</p>
申请公布号 EP0810816(A1) 申请公布日期 1997.12.03
申请号 EP19970303717 申请日期 1997.05.30
申请人 APPLIED MATERIALS, INC. 发明人 RODERICK, CRAIG A.
分类号 H05H1/46;C23F4/00;H01J37/32;H01L21/205;(IPC1-7):H05H1/46 主分类号 H05H1/46
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