| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an electrostatic chuck capable of reducing the generation of particles. <P>SOLUTION: The electrostatic chuck 10 has: a lower region 11 and an upper region 13a of a ceramic substrate; electrodes 12a, 12b that are embedded near one surface of the substrate and generate electrostatic attraction force; and a resin film 13b formed on the upper surface of the substrate. A dielectric layer 13 in the electrostatic chuck 10 is formed by the upper region 13a of the substrate, and the resin film 13b. Volume resistivity of the upper region 13a of the substrate is 1×10<SP>9</SP>-1×10<SP>12</SP>Ωcm, the surface roughness of the surface of the upper region 13a of the substrate is not more than 0.4μm in centerline average roughness Ra, and the resin film is made of a modified fluorocarbon resin. A thickness of the resin film is not less than 1μm, variations of the thickness of the resin film are not more than±30%, static friction and dynamic friction coefficients of a surface of the resin film are not more than 0.2, hardness of the resin film is 3H to F in a pencil method, and a contact angle of the resin film with water is not less than 85°. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
