发明名称 Method for producing semiconductor device and a semiconductor device, more especially a membrane sensor
摘要 <p>The semiconductor component, i.e. a micro-mechanical membrane sensor, is composed of a semiconductor carrier with a dosed zone and a membrane (240) over a cavern (250). The membrane is produced with a coherent second zone with dosing over the first, at least partially as bars, and a part of the semiconductor material is removed from the first zone. The structure is covered by a deposited monocrystalline material layer.</p>
申请公布号 EP1967488(A2) 申请公布日期 2008.09.10
申请号 EP20080104525 申请日期 2004.11.02
申请人 ROBERT BOSCH GMBH 发明人 LAMMEL, GERHARD;BENZEL, HUBERT;SCHAEFER, FRANK;ARMBRUSTER, SIMON;SCHELLING, CHRISTOPH;BRASAS, JOERG
分类号 B81B3/00;B81C1/00;G01L9/00;H01L21/00;H01L29/24;H01L33/00 主分类号 B81B3/00
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