发明名称 |
Method for producing semiconductor device and a semiconductor device, more especially a membrane sensor |
摘要 |
<p>The semiconductor component, i.e. a micro-mechanical membrane sensor, is composed of a semiconductor carrier with a dosed zone and a membrane (240) over a cavern (250). The membrane is produced with a coherent second zone with dosing over the first, at least partially as bars, and a part of the semiconductor material is removed from the first zone. The structure is covered by a deposited monocrystalline material layer.</p> |
申请公布号 |
EP1967488(A2) |
申请公布日期 |
2008.09.10 |
申请号 |
EP20080104525 |
申请日期 |
2004.11.02 |
申请人 |
ROBERT BOSCH GMBH |
发明人 |
LAMMEL, GERHARD;BENZEL, HUBERT;SCHAEFER, FRANK;ARMBRUSTER, SIMON;SCHELLING, CHRISTOPH;BRASAS, JOERG |
分类号 |
B81B3/00;B81C1/00;G01L9/00;H01L21/00;H01L29/24;H01L33/00 |
主分类号 |
B81B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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