发明名称 |
Minimal contact edge ring for rapid thermal processing |
摘要 |
Embodiments of edge rings for substrate supports of semiconductor substrate process chambers are provided herein. In some embodiments, an edge ring for a semiconductor process chamber may include an annular body having a central opening, an inner edge, an outer edge, an upper surface, and a lower surface, an inner lip disposed proximate the inner edge and extending downward from the upper surface, and a plurality of protrusions extending upward from the inner lip and disposed along the inner edge of the annular body, wherein the plurality of protrusions are arranged to support a substrate above the inner lip and over the central opening, wherein the inner lip is configured to substantially prevent light radiation from travelling between a first volume disposed above the edge ring and a second volume disposed below the edge ring when a substrate is disposed on the plurality of protrusions. |
申请公布号 |
US9403251(B2) |
申请公布日期 |
2016.08.02 |
申请号 |
US201314042864 |
申请日期 |
2013.10.01 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
Tallavarjula Sairaju;Bautista Kevin Joseph;Tobin Jeffrey |
分类号 |
F26B19/00;A45D20/40;F27D5/00;B23Q3/18;H05B3/00;H01L21/67;H01L21/687 |
主分类号 |
F26B19/00 |
代理机构 |
Moser Taboada |
代理人 |
Moser Taboada ;Taboada Alan |
主权项 |
1. An edge ring for a substrate process chamber, comprising:
an annular body having a central opening, an inner edge, an outer edge, an upper surface, and a lower surface; an inner lip disposed proximate the inner edge and extending downward from the upper surface; and a plurality of protrusions extending upward from the inner lip and disposed along the inner edge of the annular body, wherein the plurality of protrusions are arranged to support a substrate above the inner lip and over the central opening, wherein the inner lip is configured to substantially prevent light radiation from travelling between a first volume disposed above the edge ring and a second volume disposed below the edge ring when a substrate is disposed on the plurality of protrusions, and wherein a top surface of the inner lip is conditioned to substantially block light from being reflected from the top surface of the inner lip. |
地址 |
Santa Clara CA US |