RESIST COMPOSITION AND PRODUCTION METHOD OF RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a resist composition and others, from which a resist pattern having good CD uniformity can be produced.SOLUTION: The resist composition comprises: a resin (A1) containing a structural unit having an acid-labile group and no fluorine atom; a resin (A2) consisting of only a structural unit having neither fluorine atom nor acid-labile group; and an acid generator.SELECTED DRAWING: None