| 摘要 |
PROBLEM TO BE SOLVED: To provide an inspection device capable of inspecting an appearance of a substrate in high accuracy and a substrate processing therewith.SOLUTION: In an inspection device, surface image data indicating a sample substrate and a surface image of an inspection substrate are acquired. The surface image of sample substrate includes a plurality of first unit images, and the surface image of inspection substrate includes a plurality of second unit images. A relative deviation amount of first and second unit images positioned at a corresponding position is detected (step S101). On the basis of a plurality of detected deviation amounts, the relative deviation amounts of the sample substrate and the surface image of inspection substrate in each pixel are calculated (step S102). On the basis of the deviation amount in each pixel, the correspondence relation of the pixels of the surface image data of the sample substrate and the inspection substrate is corrected (step S103). On the basis of the corrected correspondence relation, a difference of a gradation value of the pixel relatively corresponding to the surface image data of each substrate is calculated. The presence or absence of the defect is determined on the basis of the difference.SELECTED DRAWING: Figure 14 |
