发明名称 |
Use of coefficient of a power curve to evaluate a semiconductor wafer |
摘要 |
A coefficient of a function that relates a measurement from a wafer to a parameter used in making the measurement (such as the power of a beam used in the measurement) is determined. The coefficient is used to evaluate the wafer (e.g. to accept or reject the wafer for further processing), and/or to control fabrication of another wafer. In one embodiment, the coefficient is used to control operation of a wafer processing unit (that may include, e.g. an ion implanter), or a heat treatment unit (such as a rapid thermal annealer).
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申请公布号 |
US2002167326(A1) |
申请公布日期 |
2002.11.14 |
申请号 |
US20010799481 |
申请日期 |
2001.03.05 |
申请人 |
BORDEN PETER G.;NIJMEIJER REGINA G.;KLEMME BEVERLY J. |
发明人 |
BORDEN PETER G.;NIJMEIJER REGINA G.;KLEMME BEVERLY J. |
分类号 |
G01R31/303;(IPC1-7):G01R31/302 |
主分类号 |
G01R31/303 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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