发明名称 Image projection apparatus
摘要 An image projection apparatus which enlarges and projects an image displayed on an image display element as a projection image on a screen, comprising the image display element displaying an image, a refracting optical system including a free-curved lens; a reflecting optical system including at least one concave mirror, and a light-blocking member including an aperture. On a sectional surface of a total light flux being introduced into the refracting optical system and is imaged on the screen after the concave mirror, when a direction A corresponds to a long side and a direction B corresponds to a short side of the projection image, the light-blocking member includes the aperture between a position in which a diameter of the total light flux in the direction A is the smallest and a position, those in the direction B is the smallest.
申请公布号 US9423683(B2) 申请公布日期 2016.08.23
申请号 US201414540372 申请日期 2014.11.13
申请人 RICOH COMPANY, LTD. 发明人 Tatsuno Hibiki
分类号 G03B21/28;G03B21/20;G03B21/14 主分类号 G03B21/28
代理机构 Oblon, McClelland, Maier & Neustadt, L.L.P 代理人 Oblon, McClelland, Maier & Neustadt, L.L.P
主权项 1. An image projection apparatus which enlarges and projects an image displayed on an image display element as a projection image on a screen, comprising: the image display element which displays an image to be enlarged and projected; a refracting optical system which includes a free-curved lens; a reflecting optical system which includes at least one concave mirror; and a light-blocking member which includes an aperture, wherein for a sectional surface of a total light flux after the concave mirror, the total light flux being a plurality of whole light beams introduced into the refracting optical system from the image display element and imaged on the screen, wherein a direction corresponding to a long side direction of the projection image is a direction A and a direction corresponding to a short side direction of the projection image is a direction B, the light-blocking member is disposed so that the aperture is located in between (1) a first position at which a width of the sectional surface in the direction A is smallest, and (2) a second position at which a width of the sectional surface in the direction B is smallest.
地址 Tokyo JP