| 摘要 |
PROBLEM TO BE SOLVED: To provide a compact electron beam irradiation device in which throughput of an electron beam exposure device is enhanced.SOLUTION: The electron beam irradiation device outputing a plurality of electron beams includes a surface electron beam source having a plurality of electron emission parts which focuses electrons emitted, respectively, from the plurality of electron emission parts while accelerating and outputs as a plurality of electron beams, and an electron lens for irradiating an object with a drawing pattern formed of the plurality of electron beams output from the surface electron beam source with a predetermined magnification. |
