| 摘要 |
<p>The invention relates to an antireflective structure for the electromagnetic radiation. According to the invention, the structure comprises thin layers whose refractive index ranges from 1.005 to 2.5, said thin layers being arranged in such a manner that a minimal reflectivity is obtained. The thickness of said layers can vary from 10 nm to 10 microns. In another embodiment, the antireflective structure consists of a single nanoporous thin layer, the nanoporosity of said layer increasing from the interface with the substrate to the interface with the external environment.</p> |
