| 发明名称 |
Barrier Film Layer, Photoelectric Device Comprising the Barrier Film Layer, and Manufacturing Method of the Photoelectric Device |
| 摘要 |
A barrier film layer, a photoelectric device comprising the barrier film layer and a manufacturing method of the photoelectric device are provided. A material forming the barrier film layer includes a topological insulator, and the barrier film layer is formed on a surface of an base plate which is patterned. In this way, a better package of the photoelectric device can be achieved. |
| 申请公布号 |
US2016204376(A1) |
申请公布日期 |
2016.07.14 |
| 申请号 |
US201414773486 |
申请日期 |
2014.12.12 |
| 申请人 |
BOE Technology Group Co., Ltd. |
发明人 |
LU Yongchun;QIAO Yong;CHENG Hongfei;XIAN Jianbo |
| 分类号 |
H01L51/52;H01L51/56 |
主分类号 |
H01L51/52 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A barrier film layer, wherein a material forming the barrier film layer comprises a topological insulator, and the barrier film layer is formed on a surface of a base plate which is patterned. |
| 地址 |
Beijing CN |
