发明名称 STRUCTURES INCORPORATING AND METHODS OF FORMING METAL LINES INCLUDING CARBON
摘要 Disclosed technology relates generally to integrated circuits, and more particularly, to structures incorporating and methods of forming metal lines including tungsten and carbon, such as conductive lines for memory arrays. In one aspect, a memory device comprises a lower conductive line extending in a first direction and an upper conductive line extending in a second direction and crossing the lower conductive line, wherein at least one of the upper and lower conductive lines comprises tungsten and carbon. The memory device additionally comprises a memory cell stack interposed at an intersection between the upper and lower conductive lines. The memory cell stack includes a first active element over the lower conductive line and a second active element over the first active element, wherein one of the first and second active elements comprises a storage element and the other of the first and second active elements comprises a selector element. The memory cell stack further includes an electrode interposed between the at least one of the upper and lower conductive lines and the closer of the first and second active elements.
申请公布号 US2016204343(A1) 申请公布日期 2016.07.14
申请号 US201514594038 申请日期 2015.01.09
申请人 MICRON TECHNOLOGY, INC. 发明人 Gotti Andrea;Gealy F. Daniel;Tortorelli Innocenzo;Varesi Enrico
分类号 H01L45/00;H01L27/24 主分类号 H01L45/00
代理机构 代理人
主权项 1. A memory device, comprising: a lower conductive line extending in a first direction; an upper conductive line extending in a second direction and crossing the lower conductive line, wherein at least one of the upper and lower conductive lines comprises tungsten and carbon; and a memory cell stack interposed at an intersection between the upper and lower conductive lines, the memory cell stack including: a first active element over the lower conductive line and a second active element over the first active element, wherein one of the first and second active elements comprises a storage element and the other of the first and second active elements comprises a selector element, and an electrode interposed between the at least one of the upper and lower conductive lines and the closer of the first and second active elements.
地址 Boise ID US