发明名称 |
METHOD OF INSPECTING SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME |
摘要 |
A method of inspecting a semiconductor device includes providing a substrate, on which a mold layer with a plurality of mold openings is provided, milling the mold layer in a direction inclined at a predetermined angle with respect to a direction normal to a top surface of the substrate, such that an inclined cutting surface exposing milled mold openings is formed, the milled mold openings including first milling openings along a first column extending in a first direction and having different heights, obtaining image data of the cutting surface, the image data including first contour images of the first milling openings, and obtaining a first process parameter, which represents an extent of bending of the mold openings according to a distance from a top surface of the substrate, using positions of center points of the first contour images. |
申请公布号 |
US2016204041(A1) |
申请公布日期 |
2016.07.14 |
申请号 |
US201614988991 |
申请日期 |
2016.01.06 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM Minkook;KO Wooseok;YANG Yusin;LEE Sangkil;JUN Chungsam |
分类号 |
H01L21/66 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
1. A method of inspecting a semiconductor device, the method comprising:
providing a substrate, on which a mold layer with a plurality of mold openings is provided; milling the mold layer in a direction inclined at a predetermined angle with respect to a direction normal to a top surface of the substrate, such that an inclined cutting surface exposing milled mold openings is formed, the milled mold openings including first milling openings along a first column extending in a first direction and having different heights; obtaining image data of the inclined cutting surface, the image data including first contour images of the first milling openings; and obtaining a first process parameter, which represents an extent of bending of the mold openings according to a distance from a top surface of the substrate, using positions of center points of the first contour images. |
地址 |
Suwon-si KR |