发明名称 半導体装置の作製方法
摘要 A method of manufacturing, with high mass productivity, light-emitting devices having highly reliable thin film transistors with excellent electric characteristics is provided. In a light-emitting device having an inverted staggered thin film transistor, the inverted staggered thin film transistor is formed as follows: a gate insulating film is formed over a gate electrode; a microcrystalline semiconductor film which functions as a channel formation region is formed over the gate insulating film; a buffer layer is formed over the microcrystalline semiconductor film; a pair of source and drain regions are formed over the buffer layer; and a pair of source and drain electrodes are formed in contact with the source and drain regions so as to expose a part of the source and drain regions.
申请公布号 JP5953357(B2) 申请公布日期 2016.07.20
申请号 JP20140224186 申请日期 2014.11.04
申请人 株式会社半導体エネルギー研究所 发明人 山崎 舜平;鈴木 幸恵;桑原 秀明
分类号 H01L29/786;H01L21/306;H01L21/336;H01L51/50;H05B33/14 主分类号 H01L29/786
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