发明名称 Solid-state imaging device and method for manufacturing the same
摘要 A solid-state imaging device, comprises: a semiconductor substrate having a first surface; a solid-state imaging element in the first surface of semiconductor substrate, the solid-state imaging element comprising a light-receiving region; a light-transmission member having a second surface and a third surface, the second surface being opposite to the third surface, wherein the light-transmission member and the first surface of the semiconductor substrate define a gap between the second surface of the light-transmission member and an outer surface of the light-receiving region; and an external connection terminal connected to the solid-state imaging element, wherein the light-transmission member comprises low α-ray glass.
申请公布号 US7688382(B2) 申请公布日期 2010.03.30
申请号 US20040895936 申请日期 2004.07.22
申请人 FUJIFILM CORPORATION 发明人 NISHIDA KAZUHIRO;MAEDA HIROSHI;NEGISHI YOSHIHISA;HOSAKA SHUNICHI;WATANABE EIJI;YASUMATSU MASATOSHI
分类号 H01L27/14;H04N5/225;H01L21/00;H01L23/02;H01L27/146;H01L27/148;H01L31/02;H01L31/10;H04N5/335;H04N5/369;H04N5/372 主分类号 H01L27/14
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