| 摘要 |
PROBLEM TO BE SOLVED: To provide a salt, an acid generator, a resist composition, and others, from which a good resist pattern excellent in CD uniformity can be produced.SOLUTION: The salt is represented by formula (I); and the acid generator and the resist composition contain the salt. In the formula, Qand Qeach represent a fluorine atom or a perfluoroalkyl group; Rand Reach represent a hydrogen atom, a fluorine atom, or a perfluoroalkyl group; z represents an integer of 0 to 6; X1 represents *-CO-O- or the like; Aand Aeach represent a single bond or *-L-CO-O-(L-CO-O)-; Land Leach represent a divalent hydrocarbon group; g represents 0 or 1; Arepresents a single bond or a divalent hydrocarbon group; Rrepresents an alicyclic hydrocarbon group, in which two hydrogen atoms in the alicyclic hydrocarbon group may be replaced by two oxygen atoms to form a ketal structure which may include a fluorine atom; and Zrepresents an organic cation.SELECTED DRAWING: None |
