| 摘要 |
An exposure apparatus includes an exposure device disposed between a mask and an object. The exposure device exposes a pattern of the mask onto the object. The apparatus also includes a mask stage associated with the exposure device to hold the mask, and a drive to move the mask stage. At least part of the drive is connected to a first support structure so that a reaction force exerted by movement of the mask stage by the drive is transferred to the first support structure. A second support structure is provided, which is dynamically isolated from the first support structure. A position detector is supported by the second support structure, and detects a position of the mask stage.
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