发明名称 Thin film transistor having LDD region and process for producing same
摘要 A thin film transistor display includes a driving circuit and an active matrix. The driving circuit comprises a first thin film transistor structure. The first thin film transistor structure includes a first gate, source and drain regions, a first LDD region, a second LDD region and a first channel region between the first and the second LDD regions. The first gate region is disposed over the first channel region, and partially or completely overlies the first and the second LDD regions. The active matrix is controlled by the driving circuit and comprises a second thin film transistor structure. The second thin film transistor structure includes a second gate, source and drain regions, a third LDD region, a fourth LDD region and a second channel region between the third and the fourth LDD regions. The second gate region is disposed over the second channel region and substantially overlaps with neither of the first and the second LDD regions.
申请公布号 US2004185607(A1) 申请公布日期 2004.09.23
申请号 US20040782533 申请日期 2004.02.19
申请人 SHIH AN;MENG CHAO-YU;GUO WEN YUAN 发明人 SHIH AN;MENG CHAO-YU;GUO WEN YUAN
分类号 G02F1/1362;H01L21/77;H01L21/84;H01L27/12;H01L29/786;(IPC1-7):H01L29/04;H01L21/00 主分类号 G02F1/1362
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