| 摘要 |
<p>An exposure apparatus and a device manufacturing method are provided to prevent generation of measurement errors of a measuring device due to deformation of a second support supporting a projection optical system by installing first and second supports for respectively supporting the measuring device and projection optical system while attenuating vibrations with first and second vibration reducing units. An exposure apparatus(100) which has a projection optical system(106), is capable of aligning a reticle(102) and a substrate(116), and exposing the substrate to the light by projecting a pattern of the reticle to the substrate through the projection optical system. The exposure apparatus comprises a measuring device(104), a first support(111), a second support(108), a first vibration reducing unit(107), and a second vibration reducing unit(109). The measuring device measures the alignment. The first support supports the measuring device. The second support supports the projection optical system. The first and second supports are isolated from each other, and are supported by a common frame(120). The first vibration reducing unit is disposed between the first support and the frame. The second vibration reducing unit is disposed between the second support and the frame.</p> |
