| 摘要 |
<p>A developing processing method and a developing processing apparatus are provided to reduce temperature change of a roller when the developing process of the apparatus is resumed, by jetting temperature control solution to at least one roller for keeping the roller at a temperature lower than ambient temperature, before a successive developing process of the apparatus is resumed. A developing processing method in which a developing process is carried out in such a manner that a target substrate after being exposed to the light is developed one after another at a predetermined tact time on a transfer passage(120) comprising a plurality of rollers(190) installed in horizontal direction at a predetermined pitch, the method is characterized by that at least one of the rollers on the transfer passage is jetted by temperature control solution for a predetermined time interval constantly or intermittently, so that the roller maintains its temperature lower than ambient temperature, before successive developing process is resumed for a group of substrates.</p> |
