发明名称 TREATING-GAS SUPPLY SYSTEM AND TREATING APPARATUS
摘要 <p>A treating-gas supply system (2) which supplies a treating gas diluted with a diluent gas to a gas use system (4). The treating-gas supply system (2) comprises a treating-gas tank (10), a diluent gas tank (12), a main gas passage (14) connecting the treating-gas tank (10) to the gas use system (4), and a diluent gas passage connecting the diluent gas tank (12) to the main gas passage.The main gas passage (14) and the diluent gas passage have flow controllers (FC1), (FC2), and (FC5) disposed therein. The diluent gas passage is connected to that part of the main gas passage which is located immediately downstream from the flow controllers except the flow controller located on the most downstream side. The system further includes an excess gas discharge passage (24) for discharging any excess diluted treating gas, the passage (24) being connected to that part of the main gas passage which is located immediately upstream from the flow controllers except the flow controller located on the most upstream side.</p>
申请公布号 KR20100039850(A) 申请公布日期 2010.04.16
申请号 KR20107001252 申请日期 2008.08.28
申请人 TOKYO ELECTRON LIMITED 发明人 MATSUMOTO KENJI;ITOH HITOSHI
分类号 H01L21/205;C23C16/455;H01L21/02 主分类号 H01L21/205
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