THIN FILM TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
摘要
The present invention relates to a display device including a thin film transistor, and a method to manufacture the same. According to an embodiment of the present invention, the method to manufacture the thin film transistor comprises: a step of forming a wall layer on a substrate; a step of forming a semiconductor layer on the wall layer; a step of forming a gate insulation film on the semiconductor layer; a step of forming a gate electrode on the gate insulation film; a step of forming an offset region on a boundary of the gate electrode via plasma heat treatment or an annealing process; a step of etching an offset region of the gate electrode; a step of etching a gate insulation film except for the gate insulation film located under the gate electrode; a step of forming an interformational insulation film on the gate electrode; and a step of forming a source electrode and a drain electrode after etching the interformational insulation film.
申请公布号
KR20160092152(A)
申请公布日期
2016.08.04
申请号
KR20150012375
申请日期
2015.01.26
申请人
SAMSUNG DISPLAY CO., LTD.
发明人
RYU, MYUNG KWAN;KIM, KI HWAN;YOON, KAP SOO;LEE, HYEON JUN;HEO, JEON GUK