| 摘要 |
Provided is an apparatus for treating products with plasma generated from a source gas. The apparatus comprises: a vacuum chamber; a plurality of juxtaposed electrodes arranged in adjacent pairs inside the vacuum chamber; and a plasma excitation source electrically coupled with the plasma. The apparatus may comprise conductive members extending into the interior of each electrode to form a respective electrical connection unit with the plasma excitation source. The apparatus may comprise a gas distribution manifold and multiple gas delivery tubes coupled with the gas distribution manifold. Each gas delivery tube has an injection port configured to inject the source gas between each adjacent pair of electrodes. The apparatus may further comprise flow restricting members that operate to partially obstruct a peripheral gap between each adjacent pair of the electrodes, each of which prevents the source gas from being emitted from the process chamber between each adjacent pair of the electrodes. |
