发明名称 |
SPUTTERING APPARATUS |
摘要 |
A magnetron assembly for a rotary target cathode comprises a rigid support structure, a magnet bar structure movably attached to the rigid support structure, and at least one actuation mechanism coupled to the rigid support structure and configured to change a distance of the magnet bar structure from a surface of a rotatable target cylinder. The magnetron assembly also includes a position indicating mechanism operative to measure a position of the magnet bar structure relative to the surface of the rotatable target cylinder. A communications device is configured to receive command signals from outside of the magnetron assembly and transmit information signals to outside of the magnetron assembly. |
申请公布号 |
EP2961857(A4) |
申请公布日期 |
2016.08.31 |
申请号 |
EP20140757416 |
申请日期 |
2014.02.25 |
申请人 |
SPUTTERING COMPONENTS, INC. |
发明人 |
CROWLEY, DANIEL THEODORE;MORSE, PATRICK LAWRENCE;GERMAN, JOHN ROBERT |
分类号 |
C23C14/34;C23C14/35;H01J37/34 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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