发明名称 PLATING APPARATUS AND PLATING METHOD
摘要 PURPOSE: A plating apparatus and plating method are provided to remove a separate power device to rotate a substrate holder by rotating a substrate holder using a substrate holder transfer part for transferring a substrate holder to a plating part. CONSTITUTION: A plating apparatus includes a plating part(130), a substrate holder, a substrate holder transferring part(140), a stoker(150) and a stoker configuring part. The plating part plates a substrate. The substrate holder holds a substrate. The substrate transferring part holds and transfers the substrate holder. The stoker stores the substrate holder. The stoker configuring part stores the stoker inside. The stoker includes a traveling mechanism for moving the stoker to inside of the stoker configuring part or from the stoker configuring part. The traveling mechanism includes a castor for moving or separating the stoker from the plating apparatus.
申请公布号 SG10201605875S(A) 申请公布日期 2016.09.29
申请号 SG10201605875S 申请日期 2012.03.07
申请人 EBARA CORPORATION 发明人 YOSHIO MINAMI
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