发明名称 LASER PROCESSING APPARATUS
摘要 Disclosed herein is a laser processing apparatus including a controller. The controller includes a target pattern detecting section performing matching between patterns formed in each device imaged and a key pattern to thereby detect a target pattern included in each device, a spacing detecting section detecting the spacing in a Y direction between the target pattern and an ablation groove formed along each division line by ablation, and a map creating section creating a map showing the spacing in the Y direction between each target pattern and the ablation groove for the plural devices arranged along the ablation groove.
申请公布号 US2016332260(A1) 申请公布日期 2016.11.17
申请号 US201615148495 申请日期 2016.05.06
申请人 DISCO CORPORATION 发明人 Odanaka Kentaro;Ohkubo Hironari;Kawasaki Zentaro
分类号 B23K26/364;B23K26/03;B23K26/00 主分类号 B23K26/364
代理机构 代理人
主权项 1. A laser processing apparatus for applying a laser beam to a wafer along a plurality of crossing division lines to form an ablation groove along each division line by ablation, said division lines being formed on a front side of said wafer to define a plurality of separate regions where a plurality of devices are each formed, said laser processing apparatus comprising: a chuck table for holding said wafer; laser beam applying means having focusing means for applying said laser beam to said wafer held on said chuck table; feeding means for relatively feeding said chuck table and said laser beam applying means in an X direction; indexing means for relatively indexing said chuck table and said laser beam applying means in a Y direction perpendicular to said X direction; an imaging unit for imaging a work area; and a controller; said controller including a target pattern detecting section performing matching between a key pattern stored in said target pattern detecting section and patterns contained in an image obtained by said imaging unit to thereby detect a target pattern included in each device,a spacing detecting section detecting the spacing in said Y direction between said target pattern and said ablation groove, anda map creating section operating said feeding means to thereby move said wafer held on said chuck table in said X direction with respect to said imaging unit, obtaining the result of detection by said target pattern detecting section for said devices arranged along said ablation groove, and finally creating a map showing the spacing in said Y direction between each target pattern and said ablation groove.
地址 Tokyo JP