Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

摘要

An immersion exposure apparatus and method exposes a substrate with a light beam via an optical element and immersion liquid. A table holds the substrate and is movable relative to the optical element. A pad member is movable relative to the table and is movable away from being opposite the optical element. While the table is arranged opposite the optical element, the pad member is movable relative to the table so that the pad member can be arranged adjacent to the table, and when the pad member is arranged adjacent to the table, the adjacent table and pad member are movable to locate the pad member opposite the optical element in place of the table such that the immersion liquid is maintained below the optical element during the movement.

主权项

1. A liquid immersion exposure apparatus that exposes a substrate with an exposure beam via an optical member and an immersion liquid, the exposure apparatus comprising:
a table arranged below the optical member and configured to hold the substrate; and a pad member that is movable relative to the table and having a surface that is arranged to be contactable with the immersion liquid, wherein the table is movable relative to the optical member such that, when the table is arranged opposite to the optical member, the immersion liquid is in contact with the optical member and is maintained between the optical member and the table, the pad member is movable relative to the optical member such that, when the pad member is arranged opposite to the optical member, the immersion liquid is in contact with the optical member and is maintained between the optical member and the pad member, one of the table and the pad member, which is arranged away from being opposite the optical member, is movable relative to the other one of the table and the pad member, which is arranged opposite to the optical member, so that the table and the pad member are adjacent to each other and so that an upper surface of the table and the surface of the pad member are juxtaposed and are substantially coplanar, the table and the pad member arranged adjacent to each other are movable relative to the optical member so that the one of the table and the pad member is arranged opposite to the optical member in place of the other one of the table and the pad member while the immersion liquid is substantially maintained under the optical member, and the other one of the table and the pad member is movable at an area away from being opposite the optical member while the one of the table and the pad member is arranged opposite to the optical member to maintain the immersion liquid under the optical member.