摘要 |
Semi-aqueous compositions useful for the selective removal of titanium nitride and/or photoresist etch residue materials relative to metal conducting, e.g., tungsten and copper, and insulating materials from a microelectronic device having same thereon. The semi-aqueous compositions contain at least one oxidant, at least one etchant, and at least one organic solvent, may contain various corrosion inhibitors to ensure selectivity. |
申请人 |
ADVANCED TECHNOLOGY MATERIALS, INC.;ATMI TAIWAN CO., LTD. |
发明人 |
CHEN, LI-MIN;COOPER, EMANUEL, I.;LIPPY, STEVEN;SONG, LINGYAN;HSU, CHIA-JUNG;TU, SHENG-HUNG;WANG, CHIEH, JU |