发明名称 SUBSTRATE PROCESS SYSTEM WITH MONITORING APPARATUS AND METHOD FOR MONITORING SUBSTRATE PROCESS
摘要 <p>PURPOSE: A substrate processing system including a monitoring device and a process monitoring method are provided to determine a normal operation state by including the monitoring device which compares the color of the substrate with the normal color. CONSTITUTION: A transfer device is positioned outside a process chamber and transfers the substrate through an outlet of the process chamber. A monitoring device(150) recognizes the color of the substrate and includes a camera and an image processor. The image processor determines whether the color of a substrate(190) is normal and includes a memory which stores the color of the substrate according to the process.</p>
申请公布号 KR20100042155(A) 申请公布日期 2010.04.23
申请号 KR20080101310 申请日期 2008.10.15
申请人 DONGBU HITEK CO., LTD. 发明人 SO, BYOUNG CHOON
分类号 H01L21/677 主分类号 H01L21/677
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