发明名称 ALUMINUM-GALLIUM-INDIUM-PHOSPHORUS-BASED LIGHT EMITTING DIODE HAVING GALLIUM NITRIDE LAYER OF UNEVEN TYPE AND METHOD FOR MANUFACTURING SAME
摘要 The present invention relates to a light emitting diode and a method for manufacturing same, and more specifically relates to growing a GaN layer of high quality on an upper part of an AlGaInP-based light emitting diode to improve the light extraction efficiency of the light emitting diode, wherein the GaN layer has a larger band gap and a smaller refractive index than AlGaInP-based material. The AlGaInP-based light emitting diode of the present invention is characterized by forming the GaN layer on the upper surface, and the GaN layer preferably has a surface of a fine uneven pattern. The GaN layer can be grown in the same system after forming the AlGaInP-based light emitting diode without an additional process.
申请公布号 US2016372633(A1) 申请公布日期 2016.12.22
申请号 US201415114066 申请日期 2014.01.29
申请人 AUK CORP 发明人 LEE Hyung Joo;KIM Young Jin;JANG In Kyu
分类号 H01L33/32;H01L33/24;H01L33/46;H01L33/38 主分类号 H01L33/32
代理机构 代理人
主权项 1. An AlGaInP-based light-emitting diode having a GaN layer located around an electrode on an upper surface of a GaP window layer.
地址 Iksan-si, Jeollabuk-do KR