发明名称 |
ALUMINUM-GALLIUM-INDIUM-PHOSPHORUS-BASED LIGHT EMITTING DIODE HAVING GALLIUM NITRIDE LAYER OF UNEVEN TYPE AND METHOD FOR MANUFACTURING SAME |
摘要 |
The present invention relates to a light emitting diode and a method for manufacturing same, and more specifically relates to growing a GaN layer of high quality on an upper part of an AlGaInP-based light emitting diode to improve the light extraction efficiency of the light emitting diode, wherein the GaN layer has a larger band gap and a smaller refractive index than AlGaInP-based material. The AlGaInP-based light emitting diode of the present invention is characterized by forming the GaN layer on the upper surface, and the GaN layer preferably has a surface of a fine uneven pattern. The GaN layer can be grown in the same system after forming the AlGaInP-based light emitting diode without an additional process. |
申请公布号 |
US2016372633(A1) |
申请公布日期 |
2016.12.22 |
申请号 |
US201415114066 |
申请日期 |
2014.01.29 |
申请人 |
AUK CORP |
发明人 |
LEE Hyung Joo;KIM Young Jin;JANG In Kyu |
分类号 |
H01L33/32;H01L33/24;H01L33/46;H01L33/38 |
主分类号 |
H01L33/32 |
代理机构 |
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代理人 |
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主权项 |
1. An AlGaInP-based light-emitting diode having a GaN layer located around an electrode on an upper surface of a GaP window layer. |
地址 |
Iksan-si, Jeollabuk-do KR |