| 发明名称 |
ELECTROSTATIC CHUCK WITH CORROSION-RESISTANT ELECTRODE CONNECTION |
| 摘要 |
<p>PURPOSE: To reduce an electrostatic stacked area exposed to plasma by removing an electrostatic stacked strap area extending beyond a pedestal tip part. CONSTITUTION: An electrostatic chuck is provided for fixing a semiconductor substrate 8 to a prescribed position within a processing chamber. The electrical connection of the electrode 34 of the electrostatic chuck protects the strap part of the chuck from erosion caused by processing environment through a pedestal 30.</p> |
| 申请公布号 |
JPH0855904(A) |
申请公布日期 |
1996.02.27 |
| 申请号 |
JP19950033891 |
申请日期 |
1995.02.22 |
| 申请人 |
APPLIED MATERIALS INC |
发明人 |
SHIYAMOIRU SHIYAMOIRIAN;MANUUCHIYAA BIRANGU;ARAN GOORUDOSUPIIRU;RON NOOSURATSUPU;SATSUSON SOMEKUU |
| 分类号 |
B23Q3/15;C23C16/44;C23C16/455;C23C16/458;H01L21/203;H01L21/205;H01L21/302;H01L21/3065;H01L21/683;H02N13/00;(IPC1-7):H01L21/68;H01L21/306 |
主分类号 |
B23Q3/15 |
| 代理机构 |
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代理人 |
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| 主权项 |
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