发明名称 No-flow underfill process and material therefor
摘要 A no-flow underfill material and process suitable for underfilling a bumped circuit component. The underfill material initially comprises a dielectric polymer material in which is dispersed a precursor capable of reacting to form an inorganic filler. The underfill process generally entails dispensing the underfill material over terminals on a substrate, and then placing the component on the substrate so that the underfill material is penetrated by the bumps on the component and the bumps contact the terminals on the substrate. The bumps are then reflowed to form solid electrical interconnects that are encapsulated by the resulting underfill layer. The precursor may be reacted to form the inorganic filler either during or after reflow.
申请公布号 US2004185602(A1) 申请公布日期 2004.09.23
申请号 US20030391231 申请日期 2003.03.18
申请人 DELPHI TECHNOLOGIES, INC. 发明人 CHAUDHURI ARUN K.;WORKMAN DEREK B.;STEPNIAK FRANK;WALSH MATTHEW R.
分类号 C08K5/54;H01L21/56;H01L21/60;H01L23/29;(IPC1-7):H01L21/50;H01L21/44;H01L21/48 主分类号 C08K5/54
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