SUBSTRATE CONCENTRATION MEASUREMENT METHOD AND SUBSTRATE CONCENTRATION MEASUREMENT APPARATUS

摘要

This invention is a method for a substrate concentration measurement method comprising measuring a concentration of a substrate in a blood specimen containing hemoglobin. In the method ,the substrate concentration is calculated by using a measurement value correlating with a substrate concentration influenced by hemoglobin and a hemoglobin concentration or a value correlating with the hemoglobin concentration. For the substrate concentration is substrate concentration measurement method according to claim 1, wherein the substrate concentration is calculated by correcting the measurement value Re correlating with the substrate concentration based on the following Formulas 1 and 2: Corrected value = 100 × Re / V % , wherein
V (%) represents a value with respect to plasma (a ratio of a measurement value influenced by hemoglobin with respect to a measurement value obtained by measuring plasma); and
Re represents a measurement value correlating with a substrate concentration influenced by hemoglobin. Value with respect to plasma V % = Vmax × Re / Km + Re + B , wherein
Vmax represents a value obtained by subtracting an intercept (B) from a value (V) with respect to plasma which is maintained constant even when a measurement value influenced by hemoglobin increases;
Km represents a value of Re at which a value V (%) with respect to plasma becomes Vmax/2; and
B represents a value (constant) of V (%) with respect to plasma when Re is 0.