| 摘要 |
PROBLEM TO BE SOLVED: To provide a defect observation device and a defect observation method of good throughput, by a defect detection system combining a defect detection system by cell comparison, and a defect detection system by die comparison.SOLUTION: From a signal obtained by irradiating a region including a first observation object position with a charged particle beam, a low magnification defect image of that region is acquired, a determination is made which of a defect detection mode by cell comparison or a defect detection mode by die comparison is applied, by using the low magnification defect image, and then a sample is moved toward a second observation object position which is observed next to the first observation object position, in parallel with the determination processing of a defect detection mode applied to the low magnification defect image.SELECTED DRAWING: Figure 3(b) |
