Modal analysis

摘要

Apparatuses and methods are disclosed for applying electromagnetic energy in a radio frequency (RF) range to an object in an energy application zone via at least one radiating element. At least one processor may be configured to determine locations of a first region and a second region in the energy application zone. In addition, the processor may be configured to regulate a source in order to apply a first predetermined amount of RF energy to the first region in the energy application zone and a second predetermined amount of RF energy to the second region in the energy application zone. The first predetermined amount of energy may be different from the second predetermined amount of energy.

主权项

1. An apparatus for applying electromagnetic energy in a radio frequency (RF) range to an object in an energy application zone via at least one radiating element, the apparatus comprising:
at least one processor programmed to:
determine locations of a first region and a second region in the energy application zone;regulate a source in order to apply a first predetermined amount of RF energy to the first region in the energy application zone and a second predetermined amount of RF energy to the second region in the energy application zone;cause application of two or more field patterns in the energy application zone, each of the field patterns having at least one high-intensity region and at least one low-intensity region, wherein field intensities associated with high-intensity regions are higher than field intensities associated with low-intensity regions;select at least one of the field patterns whose at least one high-intensity region coincides with a location of at least a portion of the object; andcause application of the selected at least one of the field patterns to the energy application zone.