发明名称 LASER DICING DEVICE AND DICING METHOD
摘要 A laser dicing device includes a laser light source, an AF light source, a light path of the processing laser light and a light path of the AF laser light being partially shared with each other, a condenser lens arranged on the shared light path between the first laser light and the second laser light, an AF signal processing unit that generates a focus error signal based on reflected light of the AF laser light reflected by the surface of the wafer, a controller that moves the condenser lens such that a distance between the condenser lens and the surface of the wafer is made constant based on the focus error signal, and a focus lens group that adjusts the position of the condensing point of the AF laser light in a state where the position of the condensing point of the processing laser light is fixed.
申请公布号 US2016372349(A1) 申请公布日期 2016.12.22
申请号 US201615252131 申请日期 2016.08.30
申请人 Tokyo Seimitsu Co., Ltd. 发明人 HYAKUMURA Kazushi
分类号 H01L21/67;B23K26/046;B23K26/0622;H01L21/268;B23K26/08;B23K26/53;H01L21/78;B23K26/00;B23K26/04 主分类号 H01L21/67
代理机构 代理人
主权项 1. A laser dicing device which forms a modified region inside a wafer by condensing a first laser light inside the wafer, comprising: a first laser light source configured to emit the first laser light; a second laser light source configured to emit a second laser light to be reflected by a surface of the wafer, the second laser light source having a light path which is partially shared with a light path of the first laser light; a condenser lens configured to condense the first laser light and the second laser light, the condenser lens being arranged on a first shared light path between the light path of the first laser light and the light path of the second laser light; a light splitter which is arranged on the light path of the second laser light and is configured to split a reflected light of the second laser light reflected by the surface of the wafer from the light path of the second laser light to a split path; a pinhole arranged between the second laser light source and the light splitter; a focus error signal generator which includes a light detector configured to receive the reflected light of the second laser light having been split to the split path by the light splitter and is configured to generate a focus error signal indicating a distance between a condensing point of the second laser light and the surface of the wafer, based on the reflected light of the second laser light which is received by the light detector; a controller configured to move the condenser lens in a thickness direction of the wafer based on the focus error signal so as to make a distance between the condenser lens and the surface of the wafer constant; and a condensing point adjuster configured to adjust a position of the condensing point of the second laser light in the thickness direction of the wafer in a state where a position of a condensing point of the first laser light is fixed, wherein the condensing point adjuster is at a position on the light path of the second laser light independent from the first shared light path, and the condensing point adjuster is arranged on a second shared light path between the second laser light and the reflected light of the second laser light.
地址 Tokyo JP