| 摘要 |
PURPOSE:To measure the line width of a circuit pattern by scanning a sample with an electron beam to obtain two pattern signals and determining the corresponding point between them through collation thereof and then determining the difference between the starting point and ending point of a pattern to be measured corresponding to those of a line width to be measured. CONSTITUTION:The one-dimensional waveform and the line profile of a reference pattern at a predetermined position are taken out from an image memory 3, an approximate waveform is determined through action of a Gaussian filter, the positional coordinates are also determined, the edge position on the original waveform is then inputted, and the reference feature positions and the like are stored in a reference pattern data memory 4 for every standard deviation. The analog image signal of a pattern to be measured is then digitized and stored in a data memory 5 for the pattern to be measured before being processed by a CPU 7 according to the measuring procedure stored in a procedure data memory 6. The reference feature position of the reference waveform is then collated repeatedly with the feature position of an input waveform for the data of the reference pattern and the pattern to be measured over a range between a high standard deviation of Gaussian filter and the lower limit thereof. |
