| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which, when used for a chemically amplified resist sensitive to a radiation, especially electron beams, exhibits excellence in resolution, sensitivity, and line edge roughness and to provide a novel copolymer useful as the resin composition of the composition. <P>SOLUTION: The copolymer has as a copolymer component repeating units containing a protective group represented by formula (1) and has a polystyrene-equivalent weight-average molecular weight of 3,000 to 100,000. In formula (1), R<SP>1</SP>is a hydrogen atom or a 1 to 4C alkyl group; R<SP>2</SP>and R<SP>3</SP>are each a hydrogen atom or a monovalent organic group, provided that at least either of them is a monovalent organic group; and l is an integer of 1 to 3. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
