发明名称 |
POSITIVE-WORKING PHOTOSENSITIVE COMPOSITION, METHOD FOR PATTERN FORMATION USING THE COMPOSITION, AND RESIN FOR USE IN THE COMPOSITION |
摘要 |
This invention provides a positive-working photosensitive composition, which, in not only ordinary exposure (dry exposure) but also liquid immersion exposure, is wide in exposure latitude and has suppressed line edge roughness, a method for pattern formation using the positive-working photosensitive composition, and a novel resin containing the positive-working photosensitive composition. The positive-working photosensitive composition comprises (A) a resin, which has a specific lactone structure on its side chain and undergoes an increase in solubility in an alkali developing solution upon the action of an acid, and (B) a compound which generates an acid upon exposure to an actinic radiation or a radiation. |
申请公布号 |
WO2009035045(A1) |
申请公布日期 |
2009.03.19 |
申请号 |
WO2008JP66444 |
申请日期 |
2008.09.11 |
申请人 |
FUJIFILM CORPORATION;YOSHIDA, YUKO;SHIMADA, KAZUTO;HIRANO, SHUJI |
发明人 |
YOSHIDA, YUKO;SHIMADA, KAZUTO;HIRANO, SHUJI |
分类号 |
C08F20/28;G03F7/039;H01L21/027 |
主分类号 |
C08F20/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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