Photosensitive resin composition, color filter and method of producing the same, and solid-state imaging device

摘要

A photosensitive resin composition is provided which provides a high resolution even when a pattern is formed using a low exposure intensity (in particular, less than 200 mJ/cm 2 ) and may inhibit deterioration in pattern rectangularity during a post baking process of a post treatment. The photosensitive resin composition includes: a resin; an oxime photopolymerization initiator; a UV absorbing agent; and a monomer containing a hydrogen bonding group, the amount of the monomer containing a hydrogen bonding group being 30 mass% or more with respect to the total solid content of the composition, and the photosensitive resin composition is used for forming a solid-state imaging device.